| 高分子 Vol.61 No.9 |
| >> Japanese | >> English |
特集 ナノインプリント技術が拓くものづくりの未来－我社のアプローチ－
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| トピックス COVER STORY: Topics and Products |
| 高エッチング耐性ナノインプリント材料 High Etching Stability NIL Material |
嶋谷 聡 Satoshi SHIMATANI |
| ＜要旨＞ When
NIL transfer material is designed, it is very important to look at material
characteristics not only for imprinted pattern but also at the capability
for the post process. Examples such as material stability in RIE, Milling
process and etc. RT-NIL by using spin-on-glass material (SOG) have been
studied. SOG material has the capability of hard processing resistance
due to its high Si-contents. However, high Si-containing materials require
high-imprint pressure in the NIL process, due to the material characteristics.
So, we have optimized SOG materials in applying a low imprint pressure
concept in the Soft Molding Process. We have also developed Si-containing
UV curable material for UV-NIL applications as a high etching selectivity
candidate. In addition, we have studied the bi-layer etching mask method
by introducing organic hard mask material as 1st layer and Si-containing
UV-NIL material as 2nd layer. Finally we have completed the development
of a process that has a very high etching selectivity. Consequently, we have successfully developed NIL transferred materials for two different
types. Keywords: High Etching Selectivity / Si-Contents / RT-NIL / Soft Molding Process / UV-NIL / Bi-Layer Process |
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| ネガ屋の憧れ － UV
ナノインプリント材料の開発－ Our Motivation, Development of UV-Curable Resins for Nanoimprint |
三宅 弘人 Hiroto MIYAKE |
| ＜要旨＞ We
are developing UV-curable resins for nanoimprint with 2 types of curing
system, cation and radical polymerization types. In this article, we
would like to introduce our motivation why we were starting the development
of nanoimprint resists. Keywords: Photo / UV / Cring / Cation / Radical / Epoxide / Nanoimprint |
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| 高分子レプリカモールドとその大型化技術 Replica Polymeric Film Mold and its Large-Scale Technology |
三澤 毅秀 Takahide MIZAWA |
| ＜要旨＞ “FleFimo®”
is a film mold for nano and micro imprinting which was developed at Soken
Chemical & engineering Co., Ltd. We can make it in a maximum size of 850 mm × 600 mm. Keywords: Nanoimprint / Mold / Stamper / Roll-to-Roll |
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| Roll-to-Roll
用SRM（継目なし円筒モールド）開発 Development of Seamless Roller Mold (SRM) for Roll-to-Roll Process |
阿部 誠之 Masayuki ABE |
| ＜要旨＞ Many
companies and institutes are developing flexible electronics devices
and optical devices. At Asahi Kasei, we have successfully commercialized
products such as Wire Grid Polarization Film, Diffusion Control Film
and Moth-Eye Film, and we are accelerating the development of other films
for flexible electronics. An important feature of flexible electronics
is low cost, which is enabled through manufacturing by roll-to-roll (Roll-to-Roll)
process. However, this Roll-to-Roll process requires a large-area seamless
roller mold (SRM), which has not been easy to achieve. We have succeeded
in the development to enable the achievement of such an SRM. This SRM’s
diameter is 100 mm, and roller width is 50 mm. On its surface, there
are 150-1000 nm line patterns in 50 mm width. In this article, its development
is described. Keywords: Nanoimprint / Roll-to-Roll / Mold / Process / Production Technology |
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| NIL モールド－
sub-20 nm を目指して－ NIL Mold – A Challenge Toward Sub-20 nm Patterning |
法元 盛久 Morihisa HOGA |
| ＜要旨＞ NIL
became the candidate of NGL in ITRS of 2003 and our NIL-mold fabrication
process development was started. Replica mold fabrication process using
J-FIL is being developed. Our target is sub-20 nm patterning, and present
capability is hp22 nm quartz pattern formation. The biggest problem for
the practical use of NIL technology is defect density control. Using
both optical and electron beam method inspection tools, we are analyzing
various kinds of defect mode and reducing the defect density of replica
process. On the other hand, replica process using a silicon master mold
is under development for HDD patterned media field. Keywords: NIL / Master Mold / Replica Mold / Quartz Mold / J-FIL |
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| ナノ加工技術の産業応用 Nanoimprint Toward Industrial Application |
宮内 昭浩 Akihiro MIYAUCHI |
| ＜要旨＞ Nanoimprint
is an attractive technology for nano-scale fabrication. The various technology
fields are relating to nanoimprint, such as precise control of press
machines, monomer/polymer materials science of especially deformations
and reaction in nano-space, and release phenomena between template and
substrate in atomic scale. The application fields are also expanding
to not only electric devices but also bio-life science and energy/enviroment
industries. This article reports the progress in Hitachi on nanoimprint
research and developments. Keywords: Nanoimprint / Machine / Material / Template / Cell Culture |
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| LED 用ナノインプリント技術・装置開発 Mass Production Nano-Imprint System for High Brightness LED |
小久保 光典 Mitsunori KOKUBO |
| ＜要旨＞ We
developed a UV-Nano Imprint method, an etching technique including improvement
of photo-resist, and a special machine for high-brightness LED fabrication.
And, we propose the improvement of an “Imprinting system for LED high-brightness
LED fabrication”. Keywords: Imprint / High-Brightness LED / PSS / PC / Roll-to-Roll |
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| 独自技術で挑戦する次世代半導体・HDD
製造 Challenges to be Applied for Next Generation CMOS and HDD Device Manufacturing with Jet and Flash Imprint Lithography |
和田 英之 Hideyuki WADA |
| ＜要旨＞ Molecular
Imprints, Inc. is a technology spin-off company from the research activities
at University of Texas for both chemical and mechanical engineering to
provide the low cost lithography solution by UV nano-imprinting based
on the advantages of it's unique technical features. The technology is
called Jet and Flash Imprint Lithography (J-FIL®) which is occasionally
emphasized by the resist dispense method with inkjet dispensing technique.
J-FIL® can realize, in addition to the high resolution, low defectivity,
high throughput, and uniform thickness control by the sophisticated system
design and control, together with the appropriately designed imprint
resist. Targeting to achieve the adoption for CMOS volume manufacturing
in 2013, Molecular Imprints had been working with several partners known
as the leading companies in the industry to realize the required capabilities.
The other major market is the HDD for bit patterned media to realize the high density recording over 1.5 TB/in2.
Less than 10 nm patterning had already been demonstrated. Keywords: J-FIL® / Low Cost / High Throughput / Thickness Uniformity / Low Defectivity / CMOS Volume Manufacturing / Bit Patterned Media |
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| 光通信用レーザーへのナノインプリントの応用 Application of Nanoimprint Lithography to Laser Diodes Used in Optical Fiber Network |
柳沢 昌輝 Masaki YANAGISAWA |
| ＜要旨＞ The
author describes nanoimprint lithography (NIL) as a fabrication method
of distributed feedback laser diodes (DFB LDs). A reverse-tone UV-NIL
is used for fabricating diffraction gratings, then a conventional and
mature LD process is used for fabricating DFB LDs. No significant difference
has been seen in the variations of characteristics between the LDs fabricated
by NIL and the conventional LDs fabricated by electron beam lithography.
The reliability of the fabricated LDs has been investigated. No significant
change has been seen in operation current up to 5000 hours. In conclusion,
nanoimprint lithography has a high potential for the wafer-level fabrication
of diffraction gratings of DFB LDs. Keywords: Nanoimprint / Distributed Feedback Laser Diodes / Diffraction Grating / Uniformity / Reliability |
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| ナノインプリントを用いたデバイス開発－ワイヤーグリッド偏光素子－ Development of Optical Devices Using Nanoimprint Technologies |
坂本 寛 Hiroshi SAKAMOTO |
| ＜要旨＞ AGC
has been developing nanoimprint technologies, photo curable resin NIF,
and some optical elements using nanoimprint process. Wire Grid Polarizer
(WGP) in the visible optical region is one application example. The WGP
has been successfully fabricated using the progress of nanotechnologies.
We try to fabricate WGP with nanoimprint and vacuum coating process.
This does not use an etching process, and seems to have high affinity
in continuous production systems. To improve the optical properties of
WGP, especially the transmittance of p-polarized light, was one of the
biggest challenges. Optimization of shape and size of the resin grid,
and precise control of vacuum coating conditions have drastically increased
the desired transmittance. Now we are also developing a roll-to-roll
nanoimprint process. This production system is expected to enable high
throughput and large area imprinting. Keywords: Nanoimprint / Wire Grid Polarizer / Visible Optical Region / Vacuum Coating Transmittance / P-Polarized Light / Roll-to-Roll |
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| 高分子科学最近の進歩 Front-Line Polymer Science |
| ナノインプリントリソグラフィーにおける離型技術 Recent Development of Demolding Technology in Nanoimprint Lithography |
中川 勝 Masaru NAKAGAWA |
| ＜要旨＞ Current
status of advanced ultraviolet nanoimprint lithography (UV-NIL) of Jet-and-Flash
Imprint lithography (J-FIL) and UV-NIL using condensable gas is introduced.
Demolding technologies of releasing cured resins from mold cavities by
using release layers for mold surfaces and surfactant additives to UV-curable
resins are summarized. Recent studies by mechanical measurements, surface
analyses, and morphological inspections in terms of realizing mass production
of nanoimprint lithography devices are described. Keywords: Nanoimprint Lithography / Demolding / Release layer / Photo-Curable Resin / Fluorescence Microscopy / Surface Segregation / Pentafluoropropane |
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| グローイングポリマー Polymer Science and I: A Personal Account |
| あれからの十年、そして十年後の自分へ Dear myself Ten Years Later |
和久 友則 Tomonori WAKU |
| ＜要旨＞ I look back on my research life in the past decade, and send a message to myself ten years later. |
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| Copyright(C) 2012 The Society of Polymer Science, Japan All Rights Reserved. |