POLYMERS Vol.61 No.9
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COVER STORY
Nanoimprint Technology Opens Versatile Possibilities of Industrial Fabrication in the Future: Original Approaches in Our Companies
Approximately 20 years ago, it was thought that in general there is no industrial mass-production technology to ever make patterns smaller than 50 nm for fabricating advanced devices. In 1995, suddenly, the preparation of such small patterns was demonstrated made from polymer resist materials and metals using nanoimprint lithography. Currently, frontier research on nanostructure devices and nanofabrication technology at single digit nanometers smaller than 10 nm are in progress. Nanoimprint lithography is considered to be one of the most promising nanofabrication techniques to realize nanoelectronics devices, magnetic recording patterned media, effectively improved light emitting diodes, and so forth. In this special issue on nanoimprint technology we introduce success stories of the field including the circumstance, breakthrough, and original approaches relevant to materials, processes, and devices in respective companies.
(Editors : NAKAGAWA, KAIDA, TAGAYA, and MATSUI (guest editor))
Digest for English Readers
680

Hot Topics in Polymer Science in Japan
683

Commentary
Landscape of Nanoimprint Technology Masanori KOMURO
684

COVER STORY: Topics and Products
High Etching Stability NIL Material Satoshi SHIMATANI
685
Our Motivation, Development of UV-Curable Resins for Nanoimprint Hiroto MIYAKE
687
Replica Polymeric Film Mold and its Large-Scale Technology Takahide MIZAWA
689
Development of Seamless Roller Mold (SRM) for Roll-to-Roll Process Masayuki ABE
691
NIL Mold – A Challenge Toward Sub-20 nm Patterning Morihisa HOGA
693
Nanoimprint Toward Industrial Application Akihiro MIYAUCHI
695
Mass Production Nano-Imprint System for High Brightness LED Mitsunori KOKUBO
697
Challenges to be Applied for Next Generation CMOS and HDD Device Manufacturing with Jet and Flash Imprint Lithography Hideyuki WADA
699
Application of Nanoimprint Lithography to Laser Diodes Used in Optical Fiber Network Masaki YANAGISAWA
701
Development of Optical Devices Using Nanoimprint Technologies Hiroshi SAKAMOTO
703

PolyMANGA
705

Front-Line Polymer Science
Recent Development of Demolding Technology in Nanoimprint Lithography Masaru NAKAGAWA
706

Polymer Science and I: A Personal Account
Dear myself Ten Years Later Tomonori WAKU

710


Messages: “Work and Life”
Japan Inter-Society Liaison Association Committee for Promoting Equal Participation of Men and Women in Science and Engineering Kazue KURIHARA
711

MACRO Economy
712

SPSJ 60th Anniversary: Messages from Research Group
713

Messages from SPSJ
720
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